카테고리 보관물: Microscope

Killer Red

Spectrum Chart

Killer Red Spectrum
Excitation () Emission ()
585 611

 

Recommended Filter set

  • 일반 형광 Lighting source 사용시

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
JNO-R1(B) 560/40
(540~580)
600 (LP) 635/60
(605~665)
Wide Excitation band,
Bandpass Emission
49008 560/40
(540~580)
600 (LP) 630/75
(592.5~667.5)
Wide Excitation band,
Bandpass Emission
49306 580/25
(567.5~592.5)
600 (LP) 625/30
(610~640)
Narrow Excitation band,
Bandpass Emission

 

  • 레이저 Lighting source 사용시

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
49910 561/10
(556~565)
561 (LP) 630/70
(595~665)
For use with laser between 557~563

Narrow Excitation band,
Bandpass Emission

49911 594/10
(589~599)
594 (LP) 645/75
(607.5~682.5)
For use with laser between 591~596

Narrow Excitation band,
Bandpass Emission

 

 

JOE

Spectrum Chart

JOE Spectrum
Excitation () Emission ()
520 548

 

Recommended Filter Set

  • 일반 형광 Lighting source 사용시

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
49023 480/40
(460~500)
510 (LP) 535/50
(510~560)
Wide Excitation band,
Bandpass Emission

 

  • 레이저 Lighting source  사용시

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
49905 514/10
(509~519)
514 (LP) 545/40
(525~565)
For use with laser between 511~517

Narrow Excitation band,
Bandpass Emission

 

 

 

 

FusionRed

Spectrum Chart

FusionRed Spectrum
Excitation () Emission ()
576 603

 

Recommended Filter Set

  • 일반 형광 Lighting source

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
JNO-R1(B) 560/40
(540~580)
600 (LP) 635/60
(605~665)
Wide Excitation band,
Bandpass Emission
49008 560/40
(540~580)
600 (LP) 630/75
(592.5~667.5)
Wide Excitation band,
Bandpass Emission
49017 560/40
(540~580)
590 (LP) 590 (LP) Wide Excitation band,
Bandpass Emission

 

  • 레이저 Lighting source 

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
49910 561/10
(556~566)
514 (LP) 630/70
(595~665)
For use with laser between 557~563

Narrow Excitation band,
Bandpass Emission

49911 594/10
(589~599)
594 (LP) 645/75
(607.5~682.5)
For use with laser 594

Narrow Excitation band,
Bandpass Emission

 

 

 

 

Eosin

Spectrum Chart

Eosin Spectrum
Excitation () Emission ()
524 545

 

Recommended Filter Set

  • 일반 형광 Lighting source

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
49023 480/40
(460~500)
510 (LP) 535/50
(510~560)
Wide Excitation band,
Bandpass Emission

 

  • 레이저 Lighting source -> 문의 주시기 바랍니다.

 

 

DyLight 549

Spectrum Chart

DyLight 549 Spectrum

 

Recommended Filter Set

  • 일반 형광 Lighting source 사용시

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
JNO-G(B) 540/25
(527.5~552.5)
565 (LP) 605/55
(577.5~632.5)
Narrow Excitation band,
Bandpass Emission
49004 545/25
(532.5~557.5)
565 (LP) 605/70
570~640)
Narrow Excitation band,
Bandpass Emission
49305 546/22
(535~557)
565 (LP) 590/33
(573.5~606.5)
Narrow Excitation band,
Bandpass Emission

 

  • 레이저 Lighting source 사용시

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
49907 532/10
(527~537)
532 (LP) 575/50
(550~600)
For use with laser between 529~535

Narrow Excitation band,
Bandpass Emission

49909 561/10
(556~566)
532 (LP) 600/50
(575~625)
For use with laser between 529~535

Narrow Excitation band,
Bandpass Emission

 

 

 

 

DiA

Spectrum Chart

DiA Spectrum
Excitation () Emission ()
456 591

 

Recommended Filter Set

  • 일반 형광 Lighting source

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
19010 480/30
(465~495)
505 (LP) 600 (LP) Medium Excitation band,
Longpass Emission
39009 480/30
(465~495)
505 (LP) 620/60
(590~650)
Medium Excitation band,
Bandpass Emission
49024 440/40
(420~460)
495 (LP) 630/75
(592.5~667.5)
Medium Excitation band,
Bandpass Emission

 

  • 레이저 Lighting source -> 문의 주시기 바랍니다.

 

 

 

 

 

Auramine

Spectrum Chart

 

Excitation () Emission ()
450 500

Recommended Filter Set

  • 일반 형광 Lighting source

Filter Model No. Excitation filter (㎚) Dichroic mirror (㎚) Emission filter (㎚) Remarks
19008 450/50
(425~475)
485 (LP) 495 (LP) Wide Excitation band,
Longpass Emission

 

  • 레이저 Lighting source -> 문의 주시기 바랍니다.

 

 

MX63/MX63L

MX63 / MX63L

 

Streamline Your Large Sample Inspection Workflow

The MX63 and MX63L microscope systems are optimized for high-quality inspections of wafers as large as 300 mm, flat panel displays, circuit boards, and other large samples. Their modular design enables you to choose the components you need to tailor the system to your application.

These ergonomic and user-friendly microscopes help increase throughput while keeping inspectors comfortable while they do their work. Combined with OLYMPUS Stream image analysis software, your entire workflow, from observation to report creation, can be simplified.

 


Functional

 

Leading-Edge Analysis Tools

The MX63 series’ versatile observation capabilities provide clear, sharp images so users can reliably detect defects in their samples. New illumination techniques and image acquisition options within OLYMPUS Stream image analysis software give users more choices for evaluating their samples and documenting their findings.


The Invisible Becomes Visible: MIX Observation and acquisition

MIX observation technology produces unique observation images by combining darkfield with another observation method, such as brightfield, fluorescence, or polarization. MIX observation enables users to view defects that are difficult to see with conventional microscopes. The circular LED illuminator used for darkfield observation has a directional darkfield function where only one quadrant is illuminated at a given time. This reduces a sample’s halation and is useful for visualizing a sample’s surface texture.

Structure on semiconductor wafer

Condenser


Easily Create Panoramic Images: Instant MIA

With multiple image alignment (MIA), users can stitch images together quickly and easily simply by moving the KY knobs on the manual stage—a motorized stage is not necessary. OLYMPUS Stream software uses pattern recognition to generate a panoramic image, giving users a wider field of view.

Instant MIA image of a coin


Create all-in-focus images: EFI

The Extended Focus Imaging (EFI) function within OLYMPUS Stream captures images of samples whose height extends beyond the depth of focus of the objective and stacks them together to create one image that is all in focus. EFI can be executed with either a manual or motorized Z-axis and creates a height map for easy structure visualization. It is also possible to construct an EFI image while offline within Stream Desktop.

Stud bump on an IC chip


Capture Both Bright and Dark Areas Using HDR

Using advanced image processing, high dynamic range (HDR) adjusts for differences in brightness within an image to reduce glare. HDR improves the visual quality of digital images thereby helping to generate professional-looking reports.


From Basic Measurement to Advanced Analysis

Measurement is essential to quality and process control and inspection. With this in mind, even the entry-level OLYMPUS Stream software package includes a full menu of interactive measurement functions, with all measurement results saved with image files for further documentation. In addition, the OLYMPUS Stream Materials Solution offers an intuitive, workflow-oriented interface for complex image analysis. At the click of a button, image analysis tasks can be executed quickly and precisely. With a significant reduction in processing time for repeated tasks, operators can concentrate on the inspection at hand.


Efficient Report Creation

Creating a report can often take longer than capturing the image and taking the measurements. OLYMPUS Stream software provides intuitive report creation to repeatedly produce smart and sophisticated reports based on pre-defined templates. Editing is simple and reports can be exported to Microsoft Word or PowerPoint software. In addition, OLYMPUS Stream software’s reporting function enables digital zooming and magnification on acquired images. Report files are a reasonable size for easier data exchange by email.


Stand-Alone Camera Option

Using a DP22 or DP27 microscope camera, the MX63 series becomes an advanced stand-alone system. The cameras can be controlled via a compact box that requires only minimal space, helping users maximize their laboratory space while still capturing clear images and making basic measurements.


Advanced Designed to Support Cleanroom Conformity

The MX63 series is designed to work in a cleanroom and has features that help minimize the risk of contaminating or damaging samples. The system has an ergonomic design that helps keep users comfortable, even during prolonged use. The MX63 series complies with international specifications and standards, including SEMI S2/S8, CE, and UL.

Optional Wafer Loader Integration ― AL120 System*

An optional wafer loader can be attached to MX63 series to safely transfer both silicon and compound semiconductor wafers from a cassette to the microscope stage without using tweezers or wands. Renowned performance and reliability enable safe, efficient front and back macro inspections while the loader helps improve productivity in the laboratory.

MX63 combined with the AL120 wafer loader (200 mm version)

 


Fast, Clean Inspections

The MX63 series delivers contamination-free wafer inspections. All motorized components are housed in a shielded structure, and antistatic processing is applied to the microscope frame, tubes, breath shield, and other parts. The rotation speed of the motorized nosepieces is faster and safer than manual nosepieces, decreasing the time between inspections while keeping the operator’s hands below the wafer, reducing potential contamination.


System Design Achieving Efficient Observations

The XY stage is capable of both coarse and fine stage movements thanks to the combination of a built-in clutch and the XY knobs. The stage helps make observations efficient, even for large samples, such as 300 mm wafers.
The tilting observation tube’s extensive range enables operators to sit at the microscope in a comfortable posture.


System Design Achieving Efficient Observations

The XY stage is capable of both coarse and fine stage movements thanks to the combination of a built-in clutch and the XY knobs. The stage helps make observations efficient, even for large samples, such as 300 mm wafers.
The tilting observation tube’s extensive range enables operators to sit at the microscope in a comfortable posture.


Accepts All Wafer Sizes

Wafer holders and glass plates

The system works with various types of 150–200 mm and 200–300 mm wafer holders and glass plates. Should the size of the wafters change on the production line, the microscope’s frame can be modified at minimal cost. With the MX63 series, different stages can be used to accommodate 75 mm, 100 mm, 125 mm, and 150 mm wafers on the inspection line.